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Altair Inspire Studio is the new solution for innovative designers, architects, and digital artists to create, evaluate and visualize designs faster than ever before. With unrivaled flexibility and precision, its unique construction history feature along with multiple modeling techniques empowers users throughout the creative process.
By building on the functions of Altair Evolve, Inspire Studio introduces a sleek, efficient user experience. Each tool and workflow are now optimized for an efficient design experience from initial sketches to exploring styling with polygonal, freeform, and PolyNURBS parametric modeling.
Produce stunning product presentations in real-time with the in-built high-quality, physically-based global illumination renderer using biased photorealistic, unbiased and GPU modes.
Running on both Mac OS X and Windows as a standalone product or under Altair's flexible token-based licensing model, Inspire Studio frees designers' creativity from the constraints of traditional CAID tools, while assuring export of robust digital models for product development. What's New
Read: InspireStudio_2022.1_ReleaseNotes_English.pdf